SUSS MicroTec Manual Mask Aligner MA/BAGen4
Compatible with substrates up to 8 inches and supports semi-auto alignment exposure equipment.
The Zeiss Microtech MA/BA GEN4 is a semi-auto alignment exposure machine capable of handling substrates up to 8 inches square. It is equipped with optimal features for R&D and small-scale production applications in MEMS, optical components manufacturing, and compound semiconductors. The optimized alignment mark observation optical system and image processing capabilities enable precise alignment with minimal variation.
- Company：兼松ＰＷＳ
- Price：Other
